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- W2044894507 abstract "Amorphous silicon (a:Si) recrystalized to poly-silicon (poly:Si) in different gas environments by excimer laser annealing (ELA) is studied. Variations of threshold laser power for the generation of surface ablation in pure N2 gas and the mixture of N2:98% and O2:2% environments are also investigated, respectively. From experiments, it is found the combination of N2:98% and O2:2% gas can enhance the threshold laser power from 320mJ/cm2 to 390mJ/cm2 for the suppressing of surface ablation phenomenon. In the condition of average grain over 0.25um, the process window (i.e. laser power for processing ability) is 30mJ/cm2 for pure N2 only, but is 50mJ/cm2 for the combination of N2:98% and O2:2%." @default.
- W2044894507 created "2016-06-24" @default.
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- W2044894507 date "2011-11-01" @default.
- W2044894507 modified "2023-09-26" @default.
- W2044894507 title "High-Quality Polysilicon Thin Film Recrystallization by Laser Annealing" @default.
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- W2044894507 doi "https://doi.org/10.4028/www.scientific.net/amr.382.26" @default.
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