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• W2045089076 startingPage "5115" @default.
• W2045089076 abstract "A nanoimprinting process that enables fabrication of self-aligned p- and n-type organic thin film transistors with small channel lengths is presented. Nanoimprint lithography with back-side exposure permit precise definition of the channel length down to the submicrometer regime and a diminutive gate to source/drain overlap. The self-aligned manufacturing process enables transistor setups with minimized electrode overlaps resulting in distinct decrease of parasitic capacitances and considerable increase in transition frequency. Fully functional small channel OTFTs with p- and n-type semiconductors are fabricated on glass as well as on flexible substrates with transition frequencies up to 400 kHz." @default.
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• W2045089076 date "2010-09-24" @default.
• W2045089076 modified "2023-10-16" @default.
• W2045089076 title "Fabrication of n- and p-Type Organic Thin Film Transistors with Minimized Gate Overlaps by Self-Aligned Nanoimprinting" @default.
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• W2045089076 doi "https://doi.org/10.1002/adma.201001947" @default.
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