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- W2045128004 abstract "Various types of plasma sputter negative heavy ion source have been developed at many institutes for various purposes, after the first negative heavy ion source using plasma sputtering was successfully operated at KEK in 1988. This type of negative heavy ion source has the capability of generating various negative heavy ion beams with a relatively large beam current in the mA range." @default.
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- W2045128004 date "1993-04-01" @default.
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- W2045128004 title "Recent development of negative heavy ion sources" @default.
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- W2045128004 doi "https://doi.org/10.1016/0168-9002(93)90616-p" @default.
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