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- W2045198601 abstract "The functionalization of fine primary particles, including nanoparticles and nanotubes, is easily carried out using atomic or molecular layer deposition (ALD or MLD, respectively) techniques. Particle ALD/MLD can be used to deposit conformal and pinhole-free films of refractory oxides, non-oxides, metals, and hybrid polymer-based materials, amongst others. Fluidized bed reactors are well-suited for large scale operations and can be operated at reduced pressures while using inert gases necessary for standard self-limiting, flow-based ALD/MLD processes. The continuous-flow processing allows for process control using an in-line mass spectrometer downstream from the reactor chamber. Many insulating, semiconducting, metallic, polymeric and hybrid inorganic/organic films have been successfully deposited on primary particle surfaces in fluidized bed reactors using a variety of precursor types. This paper reviews some of the Particle ALD/MLD work carried out by the authors, including techniques and measurements used in Particle ALD/MLD. Some current and future applications of functionalized or passivated nanomaterials are also highlighted here." @default.
- W2045198601 created "2016-06-24" @default.
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- W2045198601 date "2012-05-01" @default.
- W2045198601 modified "2023-09-27" @default.
- W2045198601 title "Functionalization of fine particles using atomic and molecular layer deposition" @default.
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- W2045198601 doi "https://doi.org/10.1016/j.powtec.2011.12.020" @default.
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