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• W2045348865 endingPage "3144" @default.
• W2045348865 startingPage "3139" @default.
• W2045348865 abstract "The effects of 10-keV and 400-keV endpoint-energy bremsstrahlung x-rays have been studied using the Monte Carlo simulator, MRED, for MOS capacitors with HfO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> gate dielectrics and TiN and TaN metal gates. We compute the reduction in dose that occurs for 10-keV x-ray irradiation of thin HfO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> gate dielectrics sandwiched between the metal gate and the Si substrate. We quantify the effects of back-end-of-line metallization layers, including copper interconnects, W vias, and borophosphosilicate glass (BPSG) and SiO <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> passivation layers for low and medium energy x-rays. For thick metallization stacks irradiated by 10-keV x-rays, dose enhancement or attenuation can occur, depending on material type and overlayer thicknesses. For similar stacks irradiated with 400-keV endpoint-energy bremsstrahlung x-rays, significant dose enhancement is observed." @default.
• W2045348865 created "2016-06-24" @default.
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• W2045348865 date "2011-12-01" @default.
• W2045348865 modified "2023-10-17" @default.
• W2045348865 title "Effects of Metal Gates and Back-End-of-Line Materials on X-Ray Dose in ${rm HfO}_{2}$ Gate Oxide" @default.
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• W2045348865 doi "https://doi.org/10.1109/tns.2011.2169279" @default.
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