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- W2045395552 abstract "We studied the characteristics of junction leakage currents of diodes having buried damage layers formed by high-energy B implantation. The efficiency of the buried layers was evaluated with respect to both microdefect dissolution and gettering of metal impurities. For this purpose, some diodes were contaminated with a uniform concentration of Pt . Results show that high-dose B implants are required for efficient removal of defects and the gettering of metal impurities, while the annealing sequence is fundamental for correct damage engineering." @default.
- W2045395552 created "2016-06-24" @default.
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- W2045395552 date "1998-08-01" @default.
- W2045395552 modified "2023-09-26" @default.
- W2045395552 title "Damage engineering and proximity gettering of metals studied by electrical measurements on Pt-contaminated diodes" @default.
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- W2045395552 doi "https://doi.org/10.1088/0268-1242/13/8/020" @default.
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