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• W2045447130 abstract "To investigate the effects of precursor ligands, metallic ruthenium films were deposited by metallorganic chemical vapor deposition (MOCVD) from three different divalent precursors, bis(2,4-dimethylpentadienyl)ruthenium [; bis-open ruthenocene type], (2,4-dimethylpentadienyl)(ethylcyclopentadienyl)ruthenium [Ru(DMPD)(EtCp); half-open ruthenocene type], and bis(ethylcyclopentadienyl)ruthenium [; ruthenocene type]. Their activation energies and the deposition amounts at were 1.27, 1.68, and 2.32 eV and 1.9, 2.3, and , respectively. The X-ray diffraction patterns indicated that the films prepared from were preferentially oriented to (001), whereas the films from and Ru(DMPD) (EtCp) showed random orientations. The resistivity of the films suggested that thinner films with lower resistivity could be deposited using ." @default.
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• W2045447130 date "2009-01-01" @default.
• W2045447130 modified "2023-10-03" @default.
• W2045447130 title "The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD" @default.
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• W2045447130 doi "https://doi.org/10.1149/1.3191715" @default.
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