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• W2045471121 abstract "Two types of magnetic tunnel junctions (MTJs) with the configuration: substrate Si(1 0 0)/SiO2 47 nm/buffer/IrMn 12 nm/CoFe 2.5 nm/Al–O 1.5 nm/NiFe 3 nm/Ta 5 nm and Si(1 0 0)/SiO2 47 nm/buffer/IrMn 10 nm/CoFeB 3 nm/MgO 2 nm/CoFeB 4 nm/Ta 5 nm were prepared by the sputtering technique with two different buffers: A-Cu 25 nm and B-Ta 5 nm/Cu 25 nm. The B buffer caused a high texture of MTJs whereas in the case of the A buffer junctions texture was weak. Crystallites in the textured layers grew in a columnar like shape that induced interfacial roughness. High textured buffer B caused high interfacial roughness that reduced the resistance-area (RA) product due to a barrier thickness fluctuation. RA also changed substantially depending on the type of a barrier. The highest RA product ∼15 MΩ μm2 was achieved for a low textured junction with Al–O barrier whereas in the high textured MgO sample RA product was ∼100 kΩ μm2. Tunnel magnetoresistance (TMR) measured at room temperature was about 45% for the samples with Al–O barrier, whereas for the samples with MgO barrier TMR was about three times higher and achieved 140%." @default.
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• W2045471121 date "2008-06-01" @default.
• W2045471121 modified "2023-10-14" @default.
• W2045471121 title "Structural and tunneling properties of magnetic tunnel junctions with Al–O and MgO barrier" @default.
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• W2045471121 doi "https://doi.org/10.1016/j.vacuum.2008.01.034" @default.
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