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• W2045493082 abstract "The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed." @default.
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• W2045493082 date "2005-10-01" @default.
• W2045493082 modified "2023-10-18" @default.
• W2045493082 title "NANO-motheye antireflection pattern by plasma treatment of polymers" @default.
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• W2045493082 doi "https://doi.org/10.1016/j.surfcoat.2005.01.067" @default.
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