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- W2045546571 abstract "ADVERTISEMENT RETURN TO ISSUEPREVNoteProjection Photolithography Utilizing a Schwarzschild Microscope and Self-Assembled Alkanethiol Monolayers as Simple Photoresists†Jane M. Behm, Keith R. Lykke, Michael J. Pellin, and John C. HemmingerView Author Information Materials Science and Chemistry Divisions, Argonne National Laboratory, Argonne, Illinois 60439, and Department of Chemistry and Institute for Surface and Interface Science, University of California, Irvine, California 92717 Cite this: Langmuir 1996, 12, 8, 2121–2124Publication Date (Web):April 17, 1996Publication History Received29 September 1995Revised2 January 1996Published online17 April 1996Published inissue 1 January 1996https://doi.org/10.1021/la950811uCopyright © 1996 American Chemical SocietyRIGHTS & PERMISSIONSArticle Views307Altmetric-Citations39LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit Read OnlinePDF (175 KB) Get e-AlertscloseSUBJECTS:Etching,Gold,Microscopy,Monolayers,Quantum mechanics Get e-Alerts" @default.
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- W2045546571 title "Projection Photolithography Utilizing a Schwarzschild Microscope and Self-Assembled Alkanethiol Monolayers as Simple Photoresists" @default.
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