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- W2045587875 abstract "We have performed a high resolution angle-resolved photoemission study on ultrathin NiO films on Ag(1 0 0) surfaces. The NiO thin films were prepared on Ag(1 0 0) at room temperature by Ni deposition in O2 atmosphere. The thickness of NiO thin films were determined by a quartz monitor and reflection high energy electron diffraction (RHEED). The low-energy electron diffraction (LEED) result shows a two-domain (2×1) pattern for the 0.9 monolayer (ML) NiO thin film at the optimum O2 pressure of 7.5×10-7 Torr at room temperature with subsequent annealing to 450 K. The (2×1) pattern evolves to a (1×1) pattern upon further annealing to 620 K in the presence of O2 or upon increasing film thickness. Photoemission spectra show finite density of states at Fermi level for 0.9 ML (2×1) NiO and 2 ML (1×1) NiO on Ag(1 0 0). Angle-resolved photoemission spectroscopy was used to measure the band dispersion of the 0.9 and 2 ML NiO thin films on Ag(1 0 0), as well as of a 10 ML film. The band dispersion of the 10 ML thick film was similar to that of the bulk crystals. Weak dispersion of valence bands was observed on the (2×1) NiO thin film, and it was very different from that on the (1×1) for 0.9 ML and 2 ML NiO thin films. The interpretation of the electronic structure of these thin films is presented." @default.
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- W2045587875 date "2007-03-01" @default.
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- W2045587875 title "The electronic structure of ultrathin NiO films on Ag(100) surfaces studied by high resolution angle-resolved photoemission spectroscopy" @default.
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- W2045587875 doi "https://doi.org/10.1016/j.jmmm.2006.10.820" @default.
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