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• W2045648727 endingPage "158" @default.
• W2045648727 startingPage "149" @default.
• W2045648727 abstract "This study assesses the efficiency of a combining ultrafiltration (UF) and electrodialysis (ED) processes to treat and reclaim wastewater, a discharge of the copper chemical mechanical planarization (Cu-CMP) process typical among semiconductor manufacturing procedures. The Cu-CMP wastewater generally contains nano-scale slurry particles and metal residues from polishing a wafer. The permeate water turbidity and UF flux for the removal of slurry particles using dilute solutions containing two commercial silica slurries were investigated. For both dilute silica slurries, permeate flux declined markedly as the particle concentration increased (500–2000 mg/l). Particle rejection rate exceeded 99.7%, and was independent of particle concentration. The ED process for removal of Cu2+ exceeded 99.3% with applied field strength of 1.5 V/cm and reaction time of 3 h. The Cu2+ was removed primarily from the solutions through adsorption onto cationic exchange membranes (CEMs) in the ED reactor. The continuous-flow ED study for low Cu2+ concentrations typical of Cu-CMP waste streams also had an excellent removal >98%. Additionally, the Cu2+ adsorbed on the CEMs was effectively recovered by 3% (w/w) HCl extraction but not by a reverse electrical field. Applications of the UF/ED system for treating actual Cu-CMP wastewater demonstrates sequential particle removal by UF and Cu2+ removal by ED, confirming the feasibility of the combined process to reclaim Cu-CMP wastewater. Cost estimate based on the laboratory data also suggests that the integrated process is economically competitive as compared to the convention coagulation process for treating Cu-CMP wastewater." @default.
• W2045648727 created "2016-06-24" @default.
• W2045648727 creator A5025331972 @default.
• W2045648727 creator A5026635488 @default.
• W2045648727 creator A5067732272 @default.
• W2045648727 creator A5088262518 @default.
• W2045648727 date "2014-12-01" @default.
• W2045648727 modified "2023-10-02" @default.
• W2045648727 title "Performance of integrated membrane filtration and electrodialysis processes for copper recovery from wafer polishing wastewater" @default.
• W2045648727 cites W1965672447 @default.
• W2045648727 cites W1967354359 @default.
• W2045648727 cites W1969963291 @default.
• W2045648727 cites W1979702310 @default.
• W2045648727 cites W2005765183 @default.
• W2045648727 cites W2010227996 @default.
• W2045648727 cites W2010854162 @default.
• W2045648727 cites W2012973994 @default.
• W2045648727 cites W2014327520 @default.
• W2045648727 cites W2017995672 @default.
• W2045648727 cites W2022927454 @default.
• W2045648727 cites W2034854157 @default.
• W2045648727 cites W2034873650 @default.
• W2045648727 cites W2038656528 @default.
• W2045648727 cites W2043402565 @default.
• W2045648727 cites W2047153446 @default.
• W2045648727 cites W2052274454 @default.
• W2045648727 cites W2054324433 @default.
• W2045648727 cites W2054793510 @default.
• W2045648727 cites W2055995714 @default.
• W2045648727 cites W2063142931 @default.
• W2045648727 cites W2067276013 @default.
• W2045648727 cites W2077505482 @default.
• W2045648727 cites W2080986020 @default.
• W2045648727 cites W2083482645 @default.
• W2045648727 cites W2089411496 @default.
• W2045648727 cites W2094347961 @default.
• W2045648727 cites W2121420674 @default.
• W2045648727 cites W2130438251 @default.
• W2045648727 cites W2132467461 @default.
• W2045648727 cites W2142274634 @default.
• W2045648727 cites W2155015773 @default.
• W2045648727 cites W2158166354 @default.
• W2045648727 cites W2159322097 @default.
• W2045648727 cites W2162561246 @default.
• W2045648727 cites W2168005376 @default.
• W2045648727 cites W2313305496 @default.
• W2045648727 doi "https://doi.org/10.1016/j.jwpe.2014.09.012" @default.
• W2045648727 hasPublicationYear "2014" @default.
• W2045648727 type Work @default.
• W2045648727 sameAs 2045648727 @default.
• W2045648727 citedByCount "31" @default.
• W2045648727 countsByYear W20456487272016 @default.
• W2045648727 countsByYear W20456487272017 @default.
• W2045648727 countsByYear W20456487272018 @default.
• W2045648727 countsByYear W20456487272019 @default.
• W2045648727 countsByYear W20456487272020 @default.
• W2045648727 countsByYear W20456487272021 @default.
• W2045648727 countsByYear W20456487272022 @default.
• W2045648727 countsByYear W20456487272023 @default.
• W2045648727 crossrefType "journal-article" @default.
• W2045648727 hasAuthorship W2045648727A5025331972 @default.
• W2045648727 hasAuthorship W2045648727A5026635488 @default.
• W2045648727 hasAuthorship W2045648727A5067732272 @default.
• W2045648727 hasAuthorship W2045648727A5088262518 @default.
• W2045648727 hasConcept C111368507 @default.
• W2045648727 hasConcept C115792997 @default.
• W2045648727 hasConcept C127313418 @default.
• W2045648727 hasConcept C127413603 @default.
• W2045648727 hasConcept C138113353 @default.
• W2045648727 hasConcept C150394285 @default.
• W2045648727 hasConcept C159985019 @default.
• W2045648727 hasConcept C178790620 @default.
• W2045648727 hasConcept C180088628 @default.
• W2045648727 hasConcept C185592680 @default.
• W2045648727 hasConcept C191897082 @default.
• W2045648727 hasConcept C192562407 @default.
• W2045648727 hasConcept C2778517922 @default.
• W2045648727 hasConcept C3128022 @default.
• W2045648727 hasConcept C39432304 @default.
• W2045648727 hasConcept C41625074 @default.
• W2045648727 hasConcept C42360764 @default.
• W2045648727 hasConcept C43617362 @default.
• W2045648727 hasConcept C50817676 @default.
• W2045648727 hasConcept C55493867 @default.
• W2045648727 hasConcept C87717796 @default.
• W2045648727 hasConcept C94061648 @default.
• W2045648727 hasConcept C94293008 @default.
• W2045648727 hasConceptScore W2045648727C111368507 @default.
• W2045648727 hasConceptScore W2045648727C115792997 @default.
• W2045648727 hasConceptScore W2045648727C127313418 @default.
• W2045648727 hasConceptScore W2045648727C127413603 @default.
• W2045648727 hasConceptScore W2045648727C138113353 @default.
• W2045648727 hasConceptScore W2045648727C150394285 @default.
• W2045648727 hasConceptScore W2045648727C159985019 @default.
• W2045648727 hasConceptScore W2045648727C178790620 @default.
• W2045648727 hasConceptScore W2045648727C180088628 @default.
• W2045648727 hasConceptScore W2045648727C185592680 @default.
• W2045648727 hasConceptScore W2045648727C191897082 @default.

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