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- W2045899663 abstract "The creation of paramagnetic defects in plasma chemical vapor deposited amorphous SiO2 exposed to a rf oxygen plasma has been studied as a function of exposure time for two plasma power densities. Unpaired Si dangling bond defects (oxygen-vacancy or oxygen-vacancy like) have been observed in densities attaining ∼4×1017 cm−3 after more than 20 min exposure. These defect levels are equivalent to 10 Mrad of 60 Co γ radiation. Ultraviolet photons in the wavelength range 250≤λ≤300 nm are shown to be responsible for the defect creation. The 130 nm O* emission is found not to be important." @default.
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- W2045899663 title "Ultraviolet-induced defect creation in amorphous SiO2 exposed to an O2 plasma" @default.
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