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- W2046133314 abstract "An empirical recipe for the amorphisation of single crystal silicon by bombardment with the group IV ions: Si+, Ge+, Sn+ and Pb+, has been developed. Samples amorphised using 29Si+ ions were implanted with boron (25 keV, 1015 ions cm−2) and annealed using conventional furnace techniques. Ion channelling and sheet resistivity measurements indicate that good regrowth and complete activation of the shallow doped layers can be obtained provided amorphisation is complete. Similar results were also obtained using 70Ge+ and 118Sn+ implants." @default.
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- W2046133314 date "1987-01-01" @default.
- W2046133314 modified "2023-10-16" @default.
- W2046133314 title "Amorphisation of silicon by bombardment with group IV ions" @default.
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- W2046133314 doi "https://doi.org/10.1016/s0168-583x(87)80062-9" @default.
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