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- W2046568068 abstract "Abstract Dry processing based on reactive plasmas was the main driven force for micro- and recently nano-electronic industry. Once with the increasing in plasma complexity new diagnostics methods have been developed to ensure a proper process control during etching, thin film deposition, ion implantation or other steps in device fabrication. This work reviews some of the unconventional methods developed in the last two decays to measure the parameters of reactive plasmas including, the test function method, thermal probes, and plasma-sheath-lens probes. The negative ion detection and surface contamination in plasmas with a high degree of contamination are also addressed." @default.
- W2046568068 created "2016-06-24" @default.
- W2046568068 creator A5068801690 @default.
- W2046568068 date "2014-12-01" @default.
- W2046568068 modified "2023-10-18" @default.
- W2046568068 title "Status and challenges in electrical diagnostics of processing plasmas" @default.
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- W2046568068 doi "https://doi.org/10.1016/j.surfcoat.2014.09.070" @default.
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