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- W2046592170 abstract "Deep level transient spectroscopy (DLTS) measurements revealed the presence of several electron and hole defects in the substrate close to the device interface after depositing Ti W Schottky barrier diodes on n- and p- type Si by S-gun sputtering. Annealing the devices at 400°C for periods of up to 7 h removed these defects but in doing so caused the formation of a new set of defects. The defects observed after annealing were distributed much deeper into the substrate than those measured in unannealed devices." @default.
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- W2046592170 date "1985-04-01" @default.
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- W2046592170 title "Deep level transient spectroscopic observations of defects induced in Si during S-gun sputter deposition of Ti-W" @default.
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- W2046592170 doi "https://doi.org/10.1016/0042-207x(85)90658-x" @default.
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