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• W2046668572 abstract "Fabrication process and numerical simulations of a distributed MEMS phase shifter fabricated on a high resistivity silicon substrate using microstereolithography technique is presented here. This fabrication technique enables reduction of the early development cost by removing the need for photomasks used for defining the MEMS bridges. The distributed MEMS phase shifter consists of a high- impedance coplanar waveguide transmission line and several MEMS bridges of 4.5 micrometers height. By applying an electrostatic voltage the height of these bridges can be adjusted. This result in a variation in the distributed capacitance of the segment of the transmission line, which manifests in the phase shift at the output terminal. Experimental efforts to improve its performance is presently underway. The fabrication procedure described here shows significant promise for the use of microstereolithography techniques for RF MEMS devices. Furthermore, the present derive is built on silicon substrate, and hence is compatible with conventional IC fabrication processes.© (2002) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
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• W2046668572 date "2002-07-10" @default.
• W2046668572 modified "2023-09-23" @default.
• W2046668572 title "<title>RF MEMS phase shifter by microstereolithography on silicon</title>" @default.
• W2046668572 doi "https://doi.org/10.1117/12.475017" @default.
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