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- W2046814683 abstract "A self-consistent quantitative analysis of recent kinetic data on the role of di- and trisilane in the plasma-induced deposition of amorphous silicon from monosilane confirms the conclusion that the dominant reactive intermediate responsible for the formation of di- and trisilane and, consequently, for the deposition of a high quality amorphous silicon is SiH2. The data show that the SiH3 radical may play only a negligible, if any, role in this process." @default.
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- W2046814683 title "Possible contribution of SiH2 and SiH3 in the plasma-induced deposition of amorphous silicon from silane" @default.
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