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- W2046918883 abstract "Experimental results of laser assisted chemical vapor deposition of nickel from Ni(CO)<SUB>4</SUB> and theoretical treatment of deposition process are presented. The nickel deposition has ben realized by scanning of Ar<SUP>+</SUP> laser beam (100 - 400 mW, (lambda) equals 515 nm and 488 nm) on Si surfaces in atmosphere of Ni(CO)<SUB>4</SUB> with 0.2 - 2.0 mbars with scanning speeds of 20 - 700 micrometers /s. As a result homogeneous Ni lines on Si have been deposited with a typical volumetric growth rate of 250 micrometers <SUP>3</SUP>/s and widths of 10 - 20 micrometers and thickness of 0.2 - 0.5 micrometers . The electrical resistivity of lines deposited was cca 7 (mu) (Omega) cm. The theoretical treatment includes computations of the temperature distribution in both gas- phase and solid substrate. The reaction rate is computed on base of local concentration and local temperatures, within the frame of finite element methods using triangles as a base of computing." @default.
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- W2046918883 date "1998-08-19" @default.
- W2046918883 modified "2023-09-23" @default.
- W2046918883 title "Nickel deposition on silicon surfaces" @default.
- W2046918883 doi "https://doi.org/10.1117/12.320989" @default.
- W2046918883 hasPublicationYear "1998" @default.
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