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- W2046976056 abstract "The (Na x K1− x )NbO3 (NKN) thin films were fabricated by using the alkoxide-based sol-gel method. The NKN stock solution was spin-coated onto a Pt/Ti/SiO2/Si substrate. The coating and drying procedures were repeated several times to obtain the film thickness of about 200 nm, and then the films were annealed at 550–700°C for 1 h. Structural properties of the NKN thin films were investigated by thermogravimetric analysis/differential scanning calorimetry, field emission scanning electron microscope and X-ray diffraction spectroscopy. The dielectric constant and the dielectric loss for the films sintered at 650°C were found to be 338 and 0.018, respectively. The results show that the NKN thin films are promising candidate for use in tunable devices application." @default.
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- W2046976056 date "2007-09-24" @default.
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- W2046976056 title "Dielectric Properties of (Na, K)NbO<sub>3</sub>Thin Films for Tunable Microwave Device Application" @default.
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- W2046976056 doi "https://doi.org/10.1080/00150190701511914" @default.
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