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• W2046978314 abstract "The growth of thin epitaxial CaSi2 films with reactive deposition epitaxy (RDE) on different crystalline silicon surfaces is described. The structure and crystalline quality are studied using transmission and scanning electron microscopy as well as X-ray diffraction. Films on (1 1 1)-Si and (1 1 0)-Si in general consist of a mixture of the tr3 and tr6 modifications of CaSi2 and show similar crystalline quality. Epitaxial films of siloxene on (1 1 1)-Si are obtained via topochemical transformation of the corresponding CaSi2 films. X-ray diffraction measurements of siloxene from pure tr6 CaSi2 show that siloxene is also present in a tr6 modification." @default.
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• W2046978314 date "1999-06-01" @default.
• W2046978314 modified "2023-10-03" @default.
• W2046978314 title "From CaSi2 to siloxene: epitaxial silicide and sheet polymer films on silicon" @default.
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• W2046978314 doi "https://doi.org/10.1016/s0022-0248(99)00135-9" @default.
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