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- W2046993496 abstract "Two-photon interferometric quantum photon lithography for light of wavelength ensuremath{lambda} is capable of beating the Rayleigh diffraction limit of resolution ensuremath{lambda}/4 to the level of ensuremath{lambda}/8. The required twin single-photon states $|1{〉}_{a}|1{〉}_{b},$ which are converted into maximally entangled states by a 50:50 beam splitter, can be generated from a nondegenerate parametric amplifier initially in vacuum states and with a weak pump field. Increasing the pump strength can slightly increase the production rate of the desired state and it will also increase the production of the twin two-photon states $|2{〉}_{a}|2{〉}_{b},$ which leads to an unwanted background term. In this paper we show that, assuming a weak pair coherent state as input to the amplifier, quantum interference can be used to quench the production of the $|2{〉}_{a}|2{〉}_{b}$ state and to enhance the production of the $|1{〉}_{a}|1{〉}_{b}$ state by almost sixfold." @default.
- W2046993496 created "2016-06-24" @default.
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- W2046993496 date "2003-04-02" @default.
- W2046993496 modified "2023-09-24" @default.
- W2046993496 title "Enhanced generation of twin single-photon states via quantum interference in parametric down-conversion: Application to two-photon quantum photolithography" @default.
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- W2046993496 doi "https://doi.org/10.1103/physreva.67.043801" @default.
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