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- W2047250053 abstract "The current status of liquid‐phase deposition (LPD) of by adding boric acid to a hydrofluosilicic acid is reviewed and compared with some new results from the authors' laboratory. Large discrepancies exist in the literature concerning the effects of various processing parameters on deposition rate. We have shown that much confusion arises from the misconception of using on additive to saturate and usng water to dilute the growth solution. In this paper the role of as a reagent and the detrimental effect of an additive as seeds for depleting the nutrient in the growth solution if added after the addition are emphasized. Despite the variations between different investigators, the following characteristics of the LPD process are in general agreement: (i) the deposition process is surface controlled, (ii) the deposition rate depends approximately linearly on temperature, (iii) the deposition rate is constant (independent of time) over a wide range of experimental conditions, and (iv) the deposition rate increases with increasing boric acid concentration." @default.
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- W2047250053 date "1997-03-01" @default.
- W2047250053 modified "2023-10-11" @default.
- W2047250053 title "On Liquid‐Phase Deposition of Silicon Dioxide by Boric Acid Addition" @default.
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- W2047250053 doi "https://doi.org/10.1149/1.1837547" @default.
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