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- W2047424038 abstract "In the paper the lithography methods are presented. Also a lithography with use AFM systems is summarized. In the work the reconstruction of the pattern created by nanoscratching and lift-off technique is show and discussed. The resolution of created structures for certain parameters of nanoscratching was also defined. Obtained resolution of reconstructed pattern was about 120 nm what was comparable with the thickness of gold masking layer." @default.
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- W2047424038 date "2011-07-01" @default.
- W2047424038 modified "2023-09-23" @default.
- W2047424038 title "Atomic force microscopy for low dimensional metal strips creation and measurements" @default.
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- W2047424038 doi "https://doi.org/10.1109/stysw.2011.6155848" @default.
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