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- W2047449969 abstract "The chemistry and microstructure of the interfacial layer formed between rf bias sputtered TiC films and steel substrates have been investigated as a function of substrate growth conditions using Auger electron spectroscopy and transmission electron microscopy. Chemical information was obtained using point-by-point independent micro-stylus and Auger measurements. A dc bias (Vs)it ranging from 0 to −1000 V was applied to the steel substrate during the initial 5 min of film deposition. It was found that under bias sputtering conditions in the presence of small partial pressures of oxygen, C was preferentially resputtered as oxygen was incorporated. A transition region was thus formed between the steel substrate and the bulk TiC film. Electron diffraction in conjunction with Auger spectroscopy was used to determine the phases present. The distribution of these phases was, in order, Fe, FeTiO3, TiO2, and TiC. The width of the transition region, w, which ranged up to 3000 Å, increased with increasing Vsit. w was not particularly sensitive to the substrate temperature during growth (Ts) except at high values of Vsit where one might expect to obtain ion bombardment enhanced diffusion. Increased film substrate adhesion, previously observed to be related to both Vsit and Ts are explained by the formation of a wide chemically graded transition region in which successive phases exhibit mutual solid solubility." @default.
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- W2047449969 date "1978-03-01" @default.
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- W2047449969 title "The nature of the transition region formed between dc-bases rf sputtered TiC films and steel substrates" @default.
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- W2047449969 doi "https://doi.org/10.1016/0039-6028(78)90382-5" @default.
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