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• W2047578076 abstract "The impact of compressive and tensile stress on CMOS performance is studied for <;100>; and <;110>; oriented silicon and SiGe channels. The <;110>; channel direction is found to be more stress sensitive whereas the <;100>; oriented transistor has a higher initial hole mobility. These results recommend to use the <;110>; channel orientation for high performance application due to the high drive current gain and <;100>; channel orientation for low power applications where no stress elements are included to ease the overall process complexity and to decrease costs." @default.
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• W2047578076 date "2012-03-01" @default.
• W2047578076 modified "2023-09-23" @default.
• W2047578076 title "Mobility and strain effects for <100> and <110> oriented silicon and SiGe transistor channels" @default.
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• W2047578076 doi "https://doi.org/10.1109/ulis.2012.6193343" @default.
• W2047578076 hasPublicationYear "2012" @default.
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