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• W2047654370 startingPage "254" @default.
• W2047654370 abstract "SrTiO 3 thin films are grown on MgO(001) substrates at growth temperatures between 600-800° C and at oxygen pressures between 10 -1 -10 -6 Torr. The initial stage of growth is controlled by graphoepitaxy with a cube-on-cube orientation. In the growth temperature range from 600° C to 740° C, graphoepitaxy occurs only at 10 -6 Torr or 740° C. At 10 -6 Torr the internal and kinetic energies of the evaporated particles contribute to the surface mobility necessary for graphoepitaxy, while at 740° C heat energy assures surface migration. However, at 800° C, the orientation changes to (111) with increasing thickness. This is because the dominant factor of film growth changes to the formation of a close-packed surface as the growth front gets farther from the substrate surface." @default.
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• W2047654370 date "1995-01-01" @default.
• W2047654370 modified "2023-09-26" @default.
• W2047654370 title "Orientation and Crystal Structure of SrTiO₃ Thin Films Prepared by Pulsed Laser Deposition" @default.
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• W2047654370 doi "https://doi.org/10.1143/jjap.34.254" @default.
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