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- W2048153465 abstract "The dual-material gate and asymmetrical halo structure is used in surrounding gate MOSFET to improve the performance. By treating the device as three surrounding-gate MOSFETs connecting in series and maintaining current continuity, a comprehensive drain current model is developed for it. It is concluded that the device also exhibits increased current drivability and improved hot carrier reliability. The derived analytical model is verified with numerical simulation." @default.
- W2048153465 created "2016-06-24" @default.
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- W2048153465 date "2010-11-01" @default.
- W2048153465 modified "2023-09-27" @default.
- W2048153465 title "Current modeling and simulation of dual-material surrounding-gate MOSFET with asymmetric halo" @default.
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- W2048153465 doi "https://doi.org/10.1109/icsict.2010.5667768" @default.
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