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- W2048208106 abstract "Structural and electrical properties of the CuO films and the ZnO/CuO heterojunctions prepared by chemical bath deposition (CBD) technique involving thermal annealing process were studied by scanning electron microscope observation, X-ray diffraction, current density-voltage (J-V) and capacitance-voltage (C-V) measurements. The as-grown CuO films showed p-type conduction after annealing in the air at temperatures (TA) ranging from 200 to 300 °C. The n-ZnO/p-CuO heterojunctions were composed of the columnar CuO grains and the ZnO nanorods (NRs) and their J-V curves exhibited rectifying characteristics with large diode ideality factors (n) and leakage currents. The insertion of the ZnO intermediate layer prepared by dip-coating (denoted by “Dip-coating ZnO”) between the ZnO and CuO layers was found to be effective for reducing the n value and suppressing the leakage current. The threshold voltage (Vth), built-in potential (Vbi) and n value of the ZnO/Dip-coating ZnO/CuO heterojunction were strongly dependent on TA and showed minima around TA=250–300 °C. Taking into account the fact that the rectification ratios of the forward current to the reverse current were very low at the same TA region, the low Vth and Vbi values are attributed to the tunneling process through the interface states introduced by the structural imperfection." @default.
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- W2048208106 date "2015-01-01" @default.
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- W2048208106 title "Structural and electrical properties of CuO films and n-ZnO/p-CuO heterojunctions prepared by chemical bath deposition based technique" @default.
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- W2048208106 doi "https://doi.org/10.1016/j.solmat.2014.08.023" @default.
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