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- W2048250380 abstract "The growth mechnism of Cu2−xS on CdS substrates was studied by Auger electron spectroscopy, when a CuCl(film)-CdS- (substrate) specimen was heat treated at ∽200°C. It was found that the reaction to form Cu2−xS would occur before heat treatment (at ∽50°C). Depth-profile measurement of a Cu2−xS-CdS specimen heat treated for ∽40 min at ∽200°C showed that the junction had a diffuse interface composed of Cu, Cd, and S with a thickness of ∽500 Å, and also that Cu and Cd atoms diffused into CdS substrate and Cu2−xS layer, respectively, to a depth of 300–600 Å." @default.
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- W2048250380 date "1978-12-01" @default.
- W2048250380 modified "2023-09-25" @default.
- W2048250380 title "AES study of the low temperature growth of Cu2−xS on CdS" @default.
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- W2048250380 doi "https://doi.org/10.1016/0022-0248(78)90477-3" @default.
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