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- W2048293800 abstract "Modifications of Cr-silicides (Cr3Si and CrSi2) induced by argon ion beams in the 2–5 keV energy range were investigated by angle integrated Auger electron spectroscopy. Simultaneous analysis of low and high energy Cr and Si Auger lines was performed to obtain concentration profiles over a range of few tens of ångströms. A metal surface enrichment was found at room temperature in both Cr3Si and CrSi2, which was stronger in the Si-rich silicide. We also investigated the sputter behaviour of CrSi2 between -80°C and 370°C. A transition to a Si-richer surface composition was observed at about 250°C, while for thermal annealing without sputtering the same transition was observed at a temperature 50°C higher. The results are discussed in terms of preferential sputtering and surface segregation supported by radiation enhanced diffusion." @default.
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- W2048293800 date "1987-01-01" @default.
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- W2048293800 title "Ar+-beam-induced surface and subsurface modifications in Cr-Si compounds" @default.
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- W2048293800 doi "https://doi.org/10.1016/s0168-583x(87)80021-6" @default.
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