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- W2048478798 abstract "The preparation of high purity a-Si:H films is discussed in order to improve material quality and to reduce the Staebler-Wronski (S-W) effect. This letter presents the preparation technique and its relationship to the S-W, or light soaking effect. By using a hot-wall type symmetric-plasma CVD system and high rate deposition method, contaminant impurity levels in a-Si:H films are significantly reduced. Photoconductivity measurements of the films show that light soaking effects are reduced with oxygen content decreases to as low as 4×10 17 /cm 3 ." @default.
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- W2048478798 date "1985-09-01" @default.
- W2048478798 modified "2023-09-25" @default.
- W2048478798 title "Preparation of High Purity a-Si:H Films and Their Light Soaking Effects" @default.
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- W2048478798 doi "https://doi.org/10.1143/jjap.24.l744" @default.
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