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- W2048504558 abstract "Molecular resist of polyphenol was evaluated as an extreme-ultraviolet resist compared with a polymer resist of poly(tert-butoxycarbonylhydroxystyrene). X-ray reflectometry was used to determine the resist-film density and measurement accuracy was improved. The molecular resist shows higher sensitivity of 3 mJ/cm2 than the polymer resist of 4 mJ/cm2. The deprotection mechanism was approximated by simple reaction equations and Fourier-transform infrared spectra was interpreted to give the products of a quantum yield and a deprotection rate constant as 9.7×10-8 and 8.1×10-8 cm3 molecule-1 s-1 for molecular and polymer resists. The higher sensitivity of the molecular resist is due to the larger efficiency of the reaction mechanism." @default.
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- W2048504558 date "2008-06-20" @default.
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- W2048504558 title "Reaction Mechanism of Extreme Ultraviolet Resists" @default.
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- W2048504558 doi "https://doi.org/10.1143/jjap.47.4918" @default.
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