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• W2048627443 abstract "In this paper, we demonstrated AlGaN/GaN metal-insulator-semiconductor high-electron mobility transistors (MIS-HEMTs) with AlN gate dielectric grown by plasmaenhanced atomic layer deposition (PEALD). The high-quality interface of AlN/AlGaN/GaN MIS-HEMTs resulted in a very small threshold voltage (Vth) hysteresis and dispersion. Simultaneously, the MIS-HEMTs exhibited a high-peak transconductance of 289 mS/mm and a small Vth shift of 0.8 V, while those for Al <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> /AlGaN/GaN metal-oxide-semiconductor HEMTs were 203 mS/mm and 5.2 V, respectively. Furthermore, analysis indicated that PEALD-grown AlN significantly reduced the interface charges at dielectric/III-N interface (from 1.2 × 10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>13</sup> to 8 × 10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>12</sup> cm <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>-2</sup> eV <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>-1</sup> for interface traps, and from 1.01 × 10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>13</sup> to 3.1 × 10 <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>11</sup> cm <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>-2</sup> for fixed charges) and improved channel transport properties (the full-width at half-maximum of channel transconductance increased from 0.9 to 2.7 V), compared with ALD-grown Al <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sub> O <sub xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>3</sub> , which could explain the differences of device characteristics." @default.
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• W2048627443 date "2015-02-01" @default.
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• W2048627443 title "Improved Interface and Transport Properties of AlGaN/GaN MIS-HEMTs With PEALD-Grown AlN Gate Dielectric" @default.
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• W2048627443 doi "https://doi.org/10.1109/ted.2014.2377781" @default.
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