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• W2048820812 abstract "In this paper we present a comparative study of two e-Beam Lithography (EBL) processes for Nanoimprinting Lithography (NIL) master mold, i.e. the standard PMMA based EBL Si patterning process and the HSQ process. 20 nm features with minimal sidewall roughness and high uniformity are demonstrated on large surface by using HSQ process. Moreover, to validate this ultra-high resolution HSQ EBL process and to check NIL resolution performances, soft UV-NIL replications were performed using soft hard-PDMS/PDMS bi-layer stamps casted on the HSQ master mold. We demonstrate the replication of sub-20 nm nanodots of high density (pitch 60 nm) with a good uniformity on the whole field area." @default.
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• W2048820812 date "2010-05-01" @default.
• W2048820812 modified "2023-10-07" @default.
• W2048820812 title "Soft UV-NIL at 20nm scale using flexible bi-layer stamp casted on HSQ master mold" @default.
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• W2048820812 doi "https://doi.org/10.1016/j.mee.2009.11.106" @default.
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