Matches in SemOpenAlex for { <https://semopenalex.org/work/W2048934080> ?p ?o ?g. }
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- W2048934080 endingPage "25" @default.
- W2048934080 startingPage "21" @default.
- W2048934080 abstract "Blend type DSA (Directed self assembly) was applied for hole patterning. The advantage of blend DSA is milder anneal condition than PS-b-PMMA BCP DSA materials, and further good point of blend DSA is studied. A blend DSA material was applied to shrink 56nmH110nmP to give 33nmH110nmP. Local CDU and wafer CDU were also improved after hole pattern shrink. Blend DSA is able to keep CDY/CDX elongated hole pattern of change. The kept shape shrink was also observed at the L-plate trench shrink. Sub-20nm hole formation was also tried with blend type DSA. From 40nmH80nmP guide-pattern, 18nmH80nmP was generated." @default.
- W2048934080 created "2016-06-24" @default.
- W2048934080 creator A5027594354 @default.
- W2048934080 creator A5046683504 @default.
- W2048934080 creator A5053914310 @default.
- W2048934080 creator A5067069148 @default.
- W2048934080 date "2012-01-01" @default.
- W2048934080 modified "2023-10-03" @default.
- W2048934080 title "Directed Self Assembly Materials for Hole Patterning" @default.
- W2048934080 cites W1984178959 @default.
- W2048934080 cites W1994914034 @default.
- W2048934080 cites W2004758240 @default.
- W2048934080 cites W2019704688 @default.
- W2048934080 cites W2043795427 @default.
- W2048934080 cites W2078355969 @default.
- W2048934080 doi "https://doi.org/10.2494/photopolymer.25.21" @default.
- W2048934080 hasPublicationYear "2012" @default.
- W2048934080 type Work @default.
- W2048934080 sameAs 2048934080 @default.
- W2048934080 citedByCount "8" @default.
- W2048934080 countsByYear W20489340802013 @default.
- W2048934080 countsByYear W20489340802014 @default.
- W2048934080 countsByYear W20489340802015 @default.
- W2048934080 countsByYear W20489340802016 @default.
- W2048934080 countsByYear W20489340802017 @default.
- W2048934080 countsByYear W20489340802018 @default.
- W2048934080 crossrefType "journal-article" @default.
- W2048934080 hasAuthorship W2048934080A5027594354 @default.
- W2048934080 hasAuthorship W2048934080A5046683504 @default.
- W2048934080 hasAuthorship W2048934080A5053914310 @default.
- W2048934080 hasAuthorship W2048934080A5067069148 @default.
- W2048934080 hasBestOaLocation W20489340801 @default.
- W2048934080 hasConcept C155310634 @default.
- W2048934080 hasConcept C159985019 @default.
- W2048934080 hasConcept C160671074 @default.
- W2048934080 hasConcept C171250308 @default.
- W2048934080 hasConcept C192562407 @default.
- W2048934080 hasConcept C2779227376 @default.
- W2048934080 hasConcept C49040817 @default.
- W2048934080 hasConceptScore W2048934080C155310634 @default.
- W2048934080 hasConceptScore W2048934080C159985019 @default.
- W2048934080 hasConceptScore W2048934080C160671074 @default.
- W2048934080 hasConceptScore W2048934080C171250308 @default.
- W2048934080 hasConceptScore W2048934080C192562407 @default.
- W2048934080 hasConceptScore W2048934080C2779227376 @default.
- W2048934080 hasConceptScore W2048934080C49040817 @default.
- W2048934080 hasIssue "1" @default.
- W2048934080 hasLocation W20489340801 @default.
- W2048934080 hasOpenAccess W2048934080 @default.
- W2048934080 hasPrimaryLocation W20489340801 @default.
- W2048934080 hasRelatedWork W2014315543 @default.
- W2048934080 hasRelatedWork W2051270029 @default.
- W2048934080 hasRelatedWork W2082293200 @default.
- W2048934080 hasRelatedWork W2137307547 @default.
- W2048934080 hasRelatedWork W2380293314 @default.
- W2048934080 hasRelatedWork W2943188944 @default.
- W2048934080 hasRelatedWork W3008690834 @default.
- W2048934080 hasRelatedWork W3082440218 @default.
- W2048934080 hasRelatedWork W4242480814 @default.
- W2048934080 hasRelatedWork W4285802202 @default.
- W2048934080 hasVolume "25" @default.
- W2048934080 isParatext "false" @default.
- W2048934080 isRetracted "false" @default.
- W2048934080 magId "2048934080" @default.
- W2048934080 workType "article" @default.