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- W2049025087 abstract "Resist poisoning is one of the key issues linked to low-k dielectric and copper integration. This phenomenon tends to be amplified in dual damascene architecture, where both processes and materials are incriminated, especially when porous low-k dielectrics are integrated. In this paper we present and implement the dose to clear compensation method, easily undertaken with standard lithography and metrology tools, to evaluate quantitatively 248 and 193nm photo-resist poisoning on both MSQ and porous MSQ substrates. We show the amplification of resist poisoning due to the reservoir effect in porous MSQ, and address the role of the porosity in the phenomenon. We demonstrate the efficiency of the method in evaluating hard masks compatibility, wet and dry stripping processes, and its ability in screening photo-resist in term of poisoning sensitivity." @default.
- W2049025087 created "2016-06-24" @default.
- W2049025087 creator A5014823666 @default.
- W2049025087 creator A5020015215 @default.
- W2049025087 creator A5055064071 @default.
- W2049025087 creator A5086338081 @default.
- W2049025087 creator A5091137781 @default.
- W2049025087 date "2003-06-11" @default.
- W2049025087 modified "2023-10-01" @default.
- W2049025087 title "Monitoring of photo-resist poisoning" @default.
- W2049025087 doi "https://doi.org/10.1117/12.485091" @default.
- W2049025087 hasPublicationYear "2003" @default.
- W2049025087 type Work @default.
- W2049025087 sameAs 2049025087 @default.
- W2049025087 citedByCount "2" @default.
- W2049025087 countsByYear W20490250872019 @default.
- W2049025087 crossrefType "proceedings-article" @default.
- W2049025087 hasAuthorship W2049025087A5014823666 @default.
- W2049025087 hasAuthorship W2049025087A5020015215 @default.
- W2049025087 hasAuthorship W2049025087A5055064071 @default.
- W2049025087 hasAuthorship W2049025087A5086338081 @default.
- W2049025087 hasAuthorship W2049025087A5091137781 @default.
- W2049025087 hasConcept C116372231 @default.
- W2049025087 hasConcept C133386390 @default.
- W2049025087 hasConcept C159985019 @default.
- W2049025087 hasConcept C171250308 @default.
- W2049025087 hasConcept C192562407 @default.
- W2049025087 hasConcept C204223013 @default.
- W2049025087 hasConcept C2779227376 @default.
- W2049025087 hasConcept C49040817 @default.
- W2049025087 hasConcept C53524968 @default.
- W2049025087 hasConcept C6648577 @default.
- W2049025087 hasConceptScore W2049025087C116372231 @default.
- W2049025087 hasConceptScore W2049025087C133386390 @default.
- W2049025087 hasConceptScore W2049025087C159985019 @default.
- W2049025087 hasConceptScore W2049025087C171250308 @default.
- W2049025087 hasConceptScore W2049025087C192562407 @default.
- W2049025087 hasConceptScore W2049025087C204223013 @default.
- W2049025087 hasConceptScore W2049025087C2779227376 @default.
- W2049025087 hasConceptScore W2049025087C49040817 @default.
- W2049025087 hasConceptScore W2049025087C53524968 @default.
- W2049025087 hasConceptScore W2049025087C6648577 @default.
- W2049025087 hasLocation W20490250871 @default.
- W2049025087 hasOpenAccess W2049025087 @default.
- W2049025087 hasPrimaryLocation W20490250871 @default.
- W2049025087 hasRelatedWork W1670518031 @default.
- W2049025087 hasRelatedWork W178758932 @default.
- W2049025087 hasRelatedWork W1990158973 @default.
- W2049025087 hasRelatedWork W2005993612 @default.
- W2049025087 hasRelatedWork W2029079688 @default.
- W2049025087 hasRelatedWork W2090150496 @default.
- W2049025087 hasRelatedWork W2138736602 @default.
- W2049025087 hasRelatedWork W2151839048 @default.
- W2049025087 hasRelatedWork W2160756404 @default.
- W2049025087 hasRelatedWork W2890402440 @default.
- W2049025087 isParatext "false" @default.
- W2049025087 isRetracted "false" @default.
- W2049025087 magId "2049025087" @default.
- W2049025087 workType "article" @default.