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- W2049045507 abstract "With the aid of the methods of the statistical design of experiments for each wafer site (x) on the graphite susceptor an empiric polynomial was obtained for CVD epitaxial silicon from SiH4–HCl–H2 mixtures, linking the growth rate vepi to the process parameters p0, p0HCl, and T(x). By means of the statistical model optimum temperatur characteristics along the susceptor were selected and discussed for specific deposition conditions. Für CVD-Epitaxiesilizium aus SiH4–HCl–H2-Gemischen wurde mit den Methoden der statistischen Versuchsplanung für jeden Scheibenplatz (x) über die Länge des Graphitheizers ein empirisches Polynom ermittelt, welches die Wachstumsgeschwindigkeit vepi mit den Prozeßparametern p0, p0HCl und T(x) verknüpft. Mit Hilfe des statistischen Modells wurden für ausgewählte Abscheidungsbedingungen optimale Temperaturverläufe auf dem Heizer ausgewählt und diskutiert." @default.
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- W2049045507 date "1982-01-01" @default.
- W2049045507 modified "2023-09-26" @default.
- W2049045507 title "Temperature profile and homogeneity of the growth rate of CVD Silicon from SiH4-HCl-H2 mixtures" @default.
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- W2049045507 doi "https://doi.org/10.1002/crat.2170170907" @default.
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