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- W2049250651 abstract "Abstract Si(1 0 0) and (1 1 1) crystals were irradiated in the random as well as in the channeling direction, using 5 MeV 19F+ ions, to a maximum fluence of approximately 1×1017 particles/cm2. The occurring deep implanted profiles were subsequently investigated using the Resonant Nuclear Reaction Analysis technique in the energy range Ep=950–1200 keV. The reaction 19F(p,αγ)16O reaction exhibits a strong resonant behavior in the above mentioned energy range, thus providing an excellent tool for the depth profiling of fluorine, yielding minimum detection limits of the order of a few ppm. The occurring profiles are analyzed with SRIM and c-TRIM codes and an attempt is made to explain the characteristics of the experimental spectra, as well as to compare with results already existing in literature." @default.
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- W2049250651 date "2003-04-01" @default.
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- W2049250651 title "Investigation of deep implanted fluorine channeling profiles in silicon using resonant NRA" @default.
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- W2049250651 doi "https://doi.org/10.1016/s0168-583x(03)00448-8" @default.
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