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- W2049281382 abstract "Heteroepitaxial nucleation of diamond on mirror-polished Si(001) substrates was achieved in a conventional hot filament reactor. The key to this achievement was the development of a bias-enhanced nucleation process step analogous to the procedure for heteroepitaxial nucleation in microwave plasma chemical vapor deposition. The nucleation and subsequent growth of diamond were characterized by means of scanning electron microscopy, scanning tunneling microscopy, and Raman spectroscopy. Well-developed diamond (001) crystal faces are observed even for very thin (∼0.3 μm) diamond films. High-resolution scanning electron microscopy investigations of the early stage of growth revealed oriented crystallites on the substrate surface with a nucleation density of 109 cm−2." @default.
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- W2049281382 date "1995-04-10" @default.
- W2049281382 modified "2023-10-03" @default.
- W2049281382 title "Heteroepitaxial nucleation of diamond on Si(001) in hot filament chemical vapor deposition" @default.
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- W2049281382 doi "https://doi.org/10.1063/1.113315" @default.
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