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• W2049672021 endingPage "1161" @default.
• W2049672021 startingPage "1159" @default.
• W2049672021 abstract "Thin films of halide free Cu–Co mixed metal oxide have been prepared at 390 °C from the heterobimetallic complex Co4(THF)4(TFA)8(μ-OH)2Cu2(dmae)2 · 0.5C7H8 (1) [dmae = N,N-dimethylaminoethanol ((CH3)2NCH2CH2O−), TFA = triflouroacetate (CF3COO−), THF = tetrahydrofurane (C4H8O)] which was prepared by the reaction of [Cu(dmae)Cl]4 and Co(TFA)2 · 4H2O. The precursor was characterized for its melting point, elemental composition, FTIR and X-ray single crystal structure determination. Thin films grown on glass substrate by using AACVD out of complex 1 were characterized by XRD and SEM. TGA and AACVD experiments reveal it to be a suitable precursor for the deposition of halide free Cu–Co mixed-metal oxide thin films at relatively low temperatures." @default.
• W2049672021 created "2016-06-24" @default.
• W2049672021 creator A5007016647 @default.
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• W2049672021 date "2008-10-01" @default.
• W2049672021 modified "2023-10-15" @default.
• W2049672021 title "Copper–cobalt heterobimetallic ceramic oxide thin film deposition: Synthesis, characterization and application of precursor" @default.
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• W2049672021 doi "https://doi.org/10.1016/j.inoche.2008.06.018" @default.
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