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• W2049725087 abstract "A comprehensive study on development of silicon oxynitride/silica based compact photonic components is presented. Plasma Enhanced Chemical Vapor Deposition technique and Reactive Ion Etching was used for development of compact directional coupler (DC) and two mode interference (TMI) coupler using a numerical model based on Simple Effective Index Method. It is found that coupling length of the conventional TMI coupler is ̃1.3 times lower than the conventional DC. In addition, numerical and experimental results are compared with Beam Propagation Method." @default.
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• W2049725087 date "2013-01-01" @default.
• W2049725087 modified "2023-10-18" @default.
• W2049725087 title "Design and fabrication of compact integrated optic waveguide coupler using SiON∕SiO[sub 2] material" @default.
• W2049725087 doi "https://doi.org/10.1063/1.4810685" @default.
• W2049725087 hasPublicationYear "2013" @default.
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