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- W2049810837 abstract "The films were grown using an inductively coupled plasma with two different precursor gas mixtures: CH4/N2 and C10H16/N2. The lateral compositional uniformity of the specimens and the resultant substrate coverage are investigated here using XPS, AES, Raman spectroscopy and SEM. X-ray photoelectron spectroscopy, because of the size of the x-ray beam used (∼5 mm), gives a gross measure of the atomic concentration of the surface. In turn, Auger analysis, using a 1 µm spot E-beam, allowed the compositional uniformity to be checked at a substantially higher lateral resolution. Additionally, Raman spectra collected from different regions of the surface confirm the outcome of the XPS and AES results obtained. In addition to XPS, AES and Raman spectroscopy, some SEM data were generated to illustrate the compositional and structural uniformity of the coating across the substrate surface. Such SEM images apart, no contribution of the substrates used to the XPS or AES spectra obtained confirmed that the films examined (150–3000 Å thick) were pinhole free. These investigations clearly show that the uniformity and the substrate coverage are a function of the deposition regime, i.e. power level, base pressure, etc., and are strongly affected by the abundance of oxygen found in the films. Copyright © 2000 John Wiley & Sons, Ltd." @default.
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- W2049810837 date "2000-03-01" @default.
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- W2049810837 title "Investigation of the uniformity and coverage of CxNy : H overcoatings during PECVD in an inductively coupled plasma" @default.
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- W2049810837 doi "https://doi.org/10.1002/(sici)1096-9918(200003)29:3<201::aid-sia686>3.0.co;2-w" @default.
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