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- W2050070807 abstract "Thermal desorption spectroscopy (TDS) is an effective tool for analysis of molecular adsorbates on a silicon wafer surface. Since the TDS uses a heat as a probe to desorb molecular absorbates from the wafer surface, it makes the molecular adsorbates themselves accessible for detection. Consequently, hydrogen, water molecule organic compounds and their fragments are detected with high sensitivity of less than 1×1012 atoms/cm2 using a mass spectrometer. The change of the surface state due to heating is also found from the desorption temperatures. TDS is expected to be very useful to detect the change due to heat of even smaller amounts in the field of semiconductor manufacturing." @default.
- W2050070807 created "2016-06-24" @default.
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- W2050070807 date "1998-01-01" @default.
- W2050070807 modified "2023-09-26" @default.
- W2050070807 title "Analysis of molecular adsorbates on Si surfaces with thermal desorption spectroscopy" @default.
- W2050070807 doi "https://doi.org/10.1063/1.56895" @default.
- W2050070807 hasPublicationYear "1998" @default.
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