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• W2050169251 endingPage "5133" @default.
• W2050169251 startingPage "5133" @default.
• W2050169251 abstract "Ferroelectric Pb(Zr,Ti)O 3 (PZT) thin films were deposited on trenched SiO 2 /Si substrates at various substrate temperatures by liquid delivery metalorganic chemical vapor deposition (MOCVD) using Pb(DPM) 2 , Zr(DIBM) 4 and Ti(O i Pr) 2 (DPM) 2 as precursors. Their step coverage increased from 38 to 80%, while their deposition rate decreased with decreasing the substrate temperature from 600 to 400°C. In the deposition on planar Pt/Ti/SiO 2 /Si substrates, the as-grown PZT films deposited under the substrate temperature of 450°C were confirmed to be amorphous; they crystallized into perovskite PZT single phase and showed ferroelectric properties after post annealing at 600°C in air for 15 min. From these results, we concluded that the combination of low-temperature deposition and post annealing is effective in improving the step coverage of PZT thin films deposited by liquid delivery MOCVD although composition control is severe in such a case because the self-regulation of lead atoms is not realized at low temperatures." @default.
• W2050169251 created "2016-06-24" @default.
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• W2050169251 date "2005-07-01" @default.
• W2050169251 modified "2023-09-28" @default.
• W2050169251 title "Improvement in Step Coverage of Pb(Zr,Ti)O₃ Thin Films Deposited by Liquid Delivery Metalorganic Chemical Vapor Deposition" @default.
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• W2050169251 doi "https://doi.org/10.1143/jjap.44.5133" @default.
• W2050169251 hasPublicationYear "2005" @default.
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