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- W2050275018 abstract "Ni-Ti thin films where the R-phase transformation occurs between 55°C and 30°C, the peak temperature being 40°C, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4 Torr, without polarization and with – 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented." @default.
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- W2050275018 date "2006-05-01" @default.
- W2050275018 modified "2023-09-27" @default.
- W2050275018 title "Optical Emission Spectroscopy Study of Magnetron Assisted Ni-Ti DC Sputtering" @default.
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- W2050275018 doi "https://doi.org/10.4028/www.scientific.net/msf.514-516.1274" @default.
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