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• W2050278730 endingPage "5757" @default.
• W2050278730 startingPage "5757" @default.
• W2050278730 abstract "The growth region of particles in SiH 4 RF discharges is investigated with the parameters of pressure, SiH 4 concentration and RF power. When the diffusion time τ D of SiH 2 radicals (key species for fast particle nucleation) through their production region is longer than their reaction time τ R with SiH 4 and sufficient SiH 2 radicals are supplied, particles grow at a high growth rate of gtrsim10's nm/s localized only around the plasma/sheath (P/S) boundary near the RF electrode where the radicals are produced. Under this condition, neutral clusters (resulting from the polymerization reactions) react with each other many times before they diffuse out of the radical production region. Since the diffusion time of clusters through the radical production region increases with cluster size, large clusters tend to be localized there and grow further to sizes on the order of nm. With τ R >τ D and/or insufficient supply of SiH 2 radicals, particles grow at a low rate of 1 nm/s and exist in the plasma bulk as well as around the P/S boundary. Such low growth rates suggest that negatively charged clusters are indispensable in order for particles to grow to above several nm in size." @default.
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• W2050278730 date "1998-10-01" @default.
• W2050278730 modified "2023-09-26" @default.
• W2050278730 title "Transition of Particle Growth Region in SiH_<b>4</b>RF Discharges" @default.
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• W2050278730 doi "https://doi.org/10.1143/jjap.37.5757" @default.
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