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• W2050674662 abstract "This paper is concerned with the electrical characteristics of low frequency (50 kHz) and high frequency (13.56 MHz) discharges used for the deposition of amorphous hydrogenated carbon thin films from CH4, C6H6 and theeir mixtures with helium gas. It is shown that the pressure P and either the current density at low frequency J or the self-bias voltage VB at high frequency are the major macroscopic parameters controlling the deposition. The growth kinetics were studied and the mass deposition rate was found to be a quasi-linear function of P12. The effects of ion bombardment are related to the products VBP−12 (13.56 MHz) and JP12 (50 kHz), the inverse square root dependence for the pressure arising from the quasi-linear evolution of the sheath thickness with P−12. This ion bombardment results in film densification. The relations between structure, properties and ion fluxes will be reported in a forthcoming publication." @default.
• W2050674662 created "2016-06-24" @default.
• W2050674662 creator A5046535420 @default.
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• W2050674662 date "1986-11-01" @default.
• W2050674662 modified "2023-09-25" @default.
• W2050674662 title "Electrical characteristics and growth kinetics in discharges used for plasma deposition of amorphous carbon" @default.
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• W2050674662 doi "https://doi.org/10.1016/0040-6090(86)90419-0" @default.
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