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• W2050836775 abstract "High resolution Si 2p photoelectron spectra obtained with synchrotron radiation are used to determine the distribution of oxidation states in the intermediary layer at the SiO2‐Si interface. A ratio of 0.4:0.3:0.3 is found for the Si3+:Si2+:Si1+ intensities independent of Si surface orientation and oxide thickness. The interface is not completely abrupt (5±1 Å width)." @default.
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• W2050836775 date "1984-01-01" @default.
• W2050836775 modified "2023-10-01" @default.
• W2050836775 title "Probing the transition layer at the SiO₂‐Si interface using core level photoemission" @default.
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• W2050836775 doi "https://doi.org/10.1063/1.94565" @default.
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