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- W2050877563 abstract "The influence of the hydrogenation procedure on the occasional collapse of the resistivity of intrinsic polysilicon during hydrogenation was studied. In specimens showing the effect, the resistivity was found to decrease in less than 10 s by 4 orders in magnitude during hydrogenation. This collapse in resistivity was traced to the formation of a highly conductive electron channel confined to the top 0.5 μm of the polysilicon surface. The creation of this conductive channel strongly depended on the hydrogenation procedure used. Slow cooling of the specimen in the hydrogen plasma always yielded a highly resistive state even in samples intentionally contaminated with sodium. On the other hand, the resistivity of such samples invariably collapsed when they were quenched to room temperature. Neutron activation analysis showed over 50% less sodium in the polysilicon surface for the slowly cooled samples when compared to those that were quenched. A model to explain these observations will be presented." @default.
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- W2050877563 date "1994-09-15" @default.
- W2050877563 modified "2023-09-26" @default.
- W2050877563 title "Instabilities in the resistivity of intrinsic polysilicon resistors during hydrogenation: Role of sodium and cooling kinetics" @default.
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